Good price  online

products details

Created with Pixso. Home Created with Pixso. Products Created with Pixso.
Vacuum Muffle Furnace
Created with Pixso. Sintering Annealing Electric Vacuum Muffle Furnace In Laboratory Heat Treatment

Sintering Annealing Electric Vacuum Muffle Furnace In Laboratory Heat Treatment

Brand Name: Chitherm
Model Number: HTF2550-07
MOQ: 1
Price: Negotiable
Delivery Time: Customized
Payment Terms: Customized
Detail Information
Place of Origin:
China
Range Of Applications:
Industrial
Type:
Electric Holding Furnace
Usage:
Steel Molding
Fuel:
Electric
Atmosphere:
Vacuum
Effective Dimensions:
Ø250*500mm
Max Vacuum Level:
5×10-4PA
Transport Package:
Wooden Packaging
Specification:
1200mm*1700mm*2200mm(W*H*D)
Trademark:
Chitherm
Origin:
China
HS Code:
8514101000
Production Capacity:
50 Sets/Year
Packaging Details:
Customized
Supply Ability:
Customized
Highlight:

annealing Vacuum Muffle Furnace

,

sintering Vacuum Muffle Furnace

,

annealing muffle furnace laboratory

Product Description
Sintering Annealing Electric Vacuum Muffle Furnace In Laboratory Heat Treatment
Product Specifications
Attribute Value
Range of Applications Industrial
Type Electric Holding Furnace
Usage Steel Molding
Fuel Electric
Atmosphere Vacuum
Effective Dimensions Ø250*500mm
Max vacuum Level 5×10-4PA
Transport Package Wooden Packaging
Specification 1200mm*1700mm*2200mm(W*H*D)
Trademark Chitherm
Origin China
HS Code 8514101000
Production Capacity 50 Sets/Year
Product Overview
Sintering Annealing Electric Vacuum Muffle Furnace In Laboratory Heat Treatment 0

Industrial Electric Fuel Chitherm HTF2550-07 Vacuum Heat Treatment Furnace with Max Vacuum Level of 5×10-4PA.

Hefei CHITHERM Equipment Co., Ltd. is an advanced equipment supplier specializing in the R&D, design, manufacturing, sales, maintenance and service of industrial heat treatment furnaces and experimental furnaces.

Our products include Bell Furnace, Hot Air Dryer, Box Furnace, Tube Furnace, Vacuum Furnace, Trolley Furnace, Rotary Furnace, Mesh Belt Furnace, Push Plate Furnace, etc., which are widely used in advanced ceramics, electronic components, thick film circuit, additive manufacturing, powder metallurgy, new energy, photovoltaic and other fields.

It is suitable for the heat treatment process of ITO target, MLCC/HTCC/LTCC, ceramic filter, magnetic material, CIM/MIM, positive and negative electrode of lithium battery, as well as pre firing, glue discharging, degreasing, firing, drying, heat treatment, curing, ceramic metallization and other processes of various new materials.

Typical Applications
  • The sintering and annealing process of electronic components, semiconductor wafers, and other related materials in a vacuum environment.
Technical Parameters
Rated Temp: 500 ºC
Max Temp: 700 ºC
Tube Material: Fused Silica
Effective Dimensions: Ø250 × 500mm (D × H)
Temp Uniformity: ± 2 ºC
Temp Zones: 3 Zones
Temp Zone Length: 300+300+300mm
Heat Power: 24kW
Insulation Power: <8kW
Heating up Speed: <15ºC/min
Thermocouple: Type K
Process Steps: 9 Steps
Max Vacuum Level: 5 × 10-4Pa
Working Vacuum Level: 1 × 10-3Pa
Vacuum Speed: <60min (up to 5 × 10-4Pa)
Alarms: Over temperature, vacuum level, gas air pressure, motor overload, and power lines reversed etc
Furnace Dimensions: 1200mm×1700mm×2200mm(W×H×D)